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Personen: Schmidt, Kristin (Autor) 
Schoberth, Heiko G (Autor) 
Ruppel, Markus (Autor) 
Zettl, Heiko (Autor) 
Hänsel, Helmut (Autor) 
Weiss, Thomas M (Autor) 
Urban, Volker (Autor) 
Krausch, Georg (Autor) 
Böker, Alexander (Autor) 
Titel: Reversible tuning of a block-copolymer nanostructure via electric fields
Quelle: Nature materials. Bd. 7. H. 2. S. 142 - 145
Erscheinungsjahr:    2008
ISBN / ISSN: 1476-1122
URL der Originalveröffentlichung doi:10.1038/nmat2068
Zeitschriftenaufsatz Zeitschriftenaufsatz
Sprache: Englisch
Open Access:
Person der Universität:    Krausch, Georg  In UnivIS suchen 
Einrichtung: Universitätsleitung
DDC-Sachgruppe:    Chemie
ID: 11072  Universitätsbibliothek Mainz
Informationen zu den Nutzungsrechten unserer Inhalte Informationen zu den Nutzungsrechten unserer Inhalte
Abstract: Block copolymers consisting of incompatible components self-assemble into microphase-separated domains yielding highly regular structures with characteristic length scales of the order of several tens of nanometres. Therefore, in the past decades, block copolymers have gained considerable potential for nanotechnological applications, such as in nanostructured networks and membranes, nanoparticle templates and high-density data storage media. However, the characteristic size of the resulting structures is usually determined by molecular parameters of the constituent polymer molecules and cannot easily be adjusted on demand. Here, we show that electric d.c. fields can be used to tune the characteristic spacing of a block-copolymer nanostructure with high accuracy by as much as 6% in a fully reversible way on a timescale in the range of several milliseconds. We discuss the influence of various physical parameters on the tuning process and study the time response of the nanostructure to the applied field. A tentative explanation of the observed effect is given on the basis of anisotropic polarizabilities and permanent dipole moments of the monomeric constituents. This electric-field-induced effect further enhances the high technological potential of block-copolymer-based soft-lithography applications.
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