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Personen: Fukunaga, Kenji (Autor) 
Hashimoto, Takeji (Autor) 
Elbs, Hubert (Autor) 
Krausch, Georg (Autor) 
Titel: Self-assembly of a lamellar ABC triblock copolymer thin film
Quelle: Macromolecules. Bd. 35. H. 11. Washington, DC : Soc. S. 4406 - 4413
Erscheinungsjahr:    2002
ISBN / ISSN: 1520-5835 ; 0024-9297
URL der Originalveröffentlichung doi:10.1021/ma011889m
Zeitschriftenaufsatz Zeitschriftenaufsatz
Sprache: Englisch
Open Access:
Person der Universität:   
Einrichtung: Universitätsleitung
DDC-Sachgruppe:    Physik
ID: 53586  Universitätsbibliothek Mainz
Informationen zu den Nutzungsrechten unserer Inhalte Informationen zu den Nutzungsrechten unserer Inhalte
Abstract: We study the self-assembly in thin films of a lamella-forming polystyrene-block-poly(2-vinylpyridine)-block-poly(tert-butyl methacrylate) triblock copolymer by means of scanning force microscopy (SFM) and cross-sectional transmission electron microscopy (TEM). We follow the time development of the microdomain structure in the films during solvent vapor treatment. After preparation on a polar substrate preferentially attracting the middle block of poly(2-vinylpyridine), the films exhibit a spongelike microdomain morphology. With subsequent solvent vapor treatment, metastable lamellae with the spacing much smaller than the equilibrium value are first formed from free surface and grow toward the substrate and eventually establishes a multilayered structure throughout the film. As a result of this process, defects associated with the lamellar structure are annihilated from the free surface and accumulated close to the solid substrate. On an extended solvent vapor treatment, the lamellae thicken toward the equilibrium value. This lamella thickening is accompanied by autophobic dewetting of the thin film.
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