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Personen: Böker, Alexander (Autor) 
Müller, Axel H. E. (Autor) 
Krausch, Georg (Autor) 
  
Titel: Functional ABC triblock copolymers for controlled surface patterns on nanometer scale
  
Quelle: Gaofenzi-cailiao-kexue-yu-gongcheng = Polymer materials science and engineering. Bd. 84. Chengdu : s.n. S. 312 - 313
Erscheinungsjahr:    2001
ISBN / ISSN: 1000-7555 ; 0743-0515
  
Dokumentart:
Zeitschriftenaufsatz Zeitschriftenaufsatz
Sprache: Englisch
Open Access:
Person der Universität:   
Einrichtung: Universitätsleitung
DDC-Sachgruppe:    Physik
ID: 53707  Universitätsbibliothek Mainz
Hinweis:
Informationen zu den Nutzungsrechten unserer Inhalte Informationen zu den Nutzungsrechten unserer Inhalte
Abstract: We synthesized analogous series of monodisperse ABC triblock copolymers with sym. end blocks A/C and different short middle blocks B (5-10 wt.-%) with varying polarities by sequential anionic polymn.; i.e. polystyrene-b-poly(2-vinylpyridine)-b-poly(Me methacrylate) (PS-b-P2VP-b-PMMA) and polystyrene-b-poly(2-hydroxyethyl methacrylate)-b-poly(Me methacrylate) (PS-b-PHEMA-b-PMMA). Thin (thickness t .apprx. 20 nm) and ultrathin films (t < 7 nm) were prepd. by either dip-coating or adsorption from soln. onto silicon wafers. In all cases, the polar middle block adsorbs preferentially to the polar substrate, which results in a polymer film surface that exclusively consists of PS and PMMA microdomains. The copolymer films were investigated by scanning force microscopy. The lateral spacing and the morphol. of the developed structures can be controlled by film thickness and A/C block length.
   
  
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